Following last artical.
6. Why should the plating parts be cleaned with water from chemical degreasing to weak acid etching?
Answer: Because the usual chemical degreasing solution is alkaline, if the degreasing solution is directly brought into the acid corrosion solution, it will neutralize the acid and alkali, reducing the concentration and effect of the acid. The product of the neutralization reaction adheres to the workpiece, which will affect the quality of the coating. Therefore, after the workpiece is chemically degreasing, it must be rinsed with clean water before it can enter the acid corrosion solution.
7. How to solve the burrs and coarse grains in the electroplating layer, which are usually caused by those reasons?
Answer: The burrs and coarse particles in the plating layer are mainly caused by the contamination of the plating solution with suspended impurities. Its sources are: dust in the air, sludge from the anode, and hydrolysis products of metal impurities. In addition, there are abnormal composition of the plating solution and unsatisfactory operating conditions and so on. The solution is to adjust the composition and operating conditions of the plating solution. If it is caused by suspended impurities, the plating solution should be filtered.
8. What is the basic procedure for preparing electroplating solution?
Answer: The basic procedure for preparing electroplating solution is as follows:
1) Put the electroplating chemicals needed for a good amount of juice into the opening tank (small tank) first, and then add an appropriate amount of clean water to dissolve them. Be careful not to pour the chemicals directly into the plating tank.
2) The impurities contained in the solution can be removed by various chemical methods and treated with activated carbon.
3) The solution that has been processed and left standstill is filtered into a clean plating tank, and water is added to the standard amount.
4) Adjust the process specifications of the plating solution (pH, temperature, additives, etc.).
5) Finally, use low current density for electrolytic deposition to remove other metal ion impurities until the solution is suitable for operation.
